Canon to Sell FPA-6400ES6a KrF Scanner From Early December: 400 Wafers Per Hour for 300mm Wafers
Canon said on November 10 that it will launch the FPA-6400ES6a in early December 2026. The machine is a krypton fluoride scanning lithography system for manufacturing memory and logic semiconductors.
Under specified conditions of 96 shots per wafer, the FPA-6400ES6a can process up to 400 300mm wafers per hour, according to the company release.
Canon said the machine offers industry-leading overlay accuracy among KrF scanners for 300mm wafers, based on its research as of November 9, 2026.
The release gave no price, exact launch date or shipment volume.
The KrF light source has a wavelength of 248 nanometers and belongs to deep ultraviolet lithography. Canon rated its earlier FPA-6300ES6a series at more than 200 wafers per hour, making the new model rated at about twice that throughput.
Published by GSM · USA (original Chinese edition)
Photo: 图：半导体洁净室内精密设备正在加工一片硅晶圆。ResearchFrontier 摄，CC BY 4.0，经 Wikimedia Commons / Photo: Precision Wafer Processing in a Cleanroom. By ResearchFrontier, CC BY 4.0, via Wikimedia Commons
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